I-CODE SLI Label IC bumped wafer specification on UV-tape
SL2ICS2001DW/V1D
I-CODE SLI Label IC bumped wafer specification on UV-tape
Rev. 3.0 — 5 February 2008
150030
Product da...
Description
SL2ICS2001DW/V1D
I-CODE SLI Label IC bumped wafer specification on UV-tape
Rev. 3.0 — 5 February 2008
150030
Product data sheet addendum
PUBLIC
1. General description
This specification describes the electrical, physical and dimensional properties of Au-bumped sawn wafers on FFC with UV-tape of I-CODE SLI Label ICs on an NXP C075EE process and is the base for delivery of tested I-CODE SLI Label ICs.
2. Ordering information
Table 1. Ordering information Package Name Description Bumped die on sawn wafer on UV-tape Odering code Type number
SL2ICS2001DW/V1D
9352 795 61005
3. Mechanical specification
3.1 Wafer Diameter: Thickness: 3.2 Wafer backside Material: Treatment: Roughness:
Si ground and stress release Ra max. 0.5 μm Rt max. 5 μm 8” 150 μm ± 15 μm
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3.3 Chip dimensions Chip size: Scribe lines: 3.4 Passivation Type: Material: Thickness:
sandwich structure PSG / Nitride (on top) 500 nm / 600 nm 900 x 780 μm2 80 / 80 μm
NXP Semiconductors
SL2ICS2001DW/V1D
I-CODE SLI Label IC bumped wafer specification on UV-tape
PUBLIC
3.5 Au bump
Bump material: Bump hardness: Bump shear strength: Bump height: Bump height uniformity: – within a die: – within a wafer: – wafer to wafer: ± 2 μm ± 3 μm ± 4 μm ± 1.5 μm 92 x 92 μm2 62 x 62 μm2 78 x 78 μm2 48 x 48 μm2 ± 5 μm sputtered TiW > 99.9 % pure Au 35 – 80 HV 0.005 > 70 MPa 18 μm
Bump flatness: Bump size:
– LA, LB – VSS1, TESTIO1
Pad size (unbumped):
– LA, LB – VSS1, TESTIO1
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